1064nm Q-Switched DPSS Lasers
       1064nm DPSS Laser Source      Specifications     Diagrams     Applications         
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1064 nm Q-Switched Diode-Pumped Solid State Laser   

Model        Power                
UP-5             5 Watts
UP-10         10 Watts           
UP-20         20 Watts

For customers who require a compact, efficient, precision laser without the marking head, scanner or marking software, ideal for a variety of OEM, Materials Processing and Scientific Applications

RMI DPSS Laser Systems feature single mode (TEM00) beam operation and the shortest Q-Switch pulse duration in their class. This results in a higher energy density, higher peak power and better materials processing than with competing systems.
Easy Integration: Hardware and Software
Laser control is available through the controller using the following options:

• Easy to use front panel controls
• RS232 serial communication
• Analog current control for pump diode (0-10V)
• Analog FPS control for laser source (0-5V)
• Programmable digital I/O’s (PLC – compatible)
• Digital pulse triggering
• External first pulse suppression
• Remote interlock
• Firmware update in the field through RS232




       1064nm DPSS Laser Source      Specifications     Diagrams     Applications        




       1064nm DPSS Laser Source      Specifications     Diagrams     Applications        


Output Characteristics UP-5
UP-10
UP-20
Laser Output Wavelength [nm]

1064nm

Maximum Average Power [W] @ 40 kHz
5 (CW)
10 (CW)
 >20 (CW)
Pulse Width2 [ns] @10 kHz
~15
 ~10   ~7
Peak Power2, up to [kW]  30  70  150
Pulse Energy2 up to [μJ]
300
500
 1000
Frequency Range [kHz]
1 - 200
  1 - 200   10 - 200
Mode2
TEM00
Beam Quality2 (M2)

~ 1.3

Beam Ellipticity2 [%]
< 10%
Beam Pointing Stability2 [mrad]

< 0.1

Polarization3
> 1:100 (Vertical)
Beam Diameter at output [mm]

0.5 mm

Beam Divergence, full angle2 [mrad]
< 2.5 mrad
< 3 mrad
 < 3 mrad
Short Term Stability2 [%]

2.5

Long Term Stability2 [%]

4

Physical Characteristics
Controller

17.1" x 17.5" x 5.2" (433 mm x 445 mm x 133 mm)

Resonator

7" x 5.75" x 4.15" (178 mm x 146 mm x 105 mm)

Fiber Length

Standard 2 m (up to 10 m)

Controller Weight

25.2 lbs (11.5 kg)

 32.7 (14.8 kg)
Resonator Weight

6 lbs (2.7 kgs)

 10 (4.5 kg)
Environment
Operating Temperature Range

50°F - 104°F (10°C - 40°C)

Operating Humidity Range

0 - 80% non-condensing

Warm up time (cold start) [min]

~ 5

Warm up time (warm start) [min]

~ 0.5

Maximum operating altitude

<6600' (2000 m)

Transport temperature range

  +131°F  -58°F (+55°C  -50°C)

1: As a result of RMI Laser's policy of continuous product improvement, specifications are subject to change without notice.

2: At optimum parameters.

3: Relative to baseplate.

       1064nm DPSS Laser Source      Specifications     Diagrams     Applications         


       1064nm DPSS Laser Source      Specifications     Diagrams     Applications        

Image

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       1064nm DPSS Laser Source      Specifications     Diagrams     Applications         



       1064nm DPSS Laser Source      Specifications     Diagrams     Applications        
   
  • Resistor Trimming
The use of 1064 nm lasers in processing microelectronic devices, such as the trimming of thick and thin film resistors is well established that the laser has become a common tool for this application. This is especially true for high-volume, high-accuracy trimming operations.

  • Spectroscopy
Raman scattering is a valuable spectroscopic technique having a number of applications involving solid, liquid or gas samples. The Raman effect occurs when a sample is irradiated with 1064 nm (cw) laser light and a small fraction of  the radiation scattered from the sample exhibits shifted frequencies that correspond to the sample's vibrational transitions.

  • Manufacture of OEM Marking Equipment
One of the largest uses for 1064 nm DPSS lasers is for incorporation into laser marking equipment, since most marker manufacturers do not manufacture the lasers themselves. RMI Laser is one of the most highly respected suppliers of 1064nm laser platforms for this purpose. Please contact our in-house integration department for more information.

  • Solar Cell Scribing
Scribing on conductive films used in thin film solar cells is often achieved with 1064 nm laser scribing. Machines used to accomplish this can accommodate very large photovoltaic cells and rapidly scribe the conductive film by using multiple heads. The manufacturing process can also involve laser micro-drilling and cutting operations in silicon using the same equipment.

  • Silicon Wafer Processing
1064 nm lasers are used in wafer processing in a variety of applications including  scribing, cutting and microdrilling as well as for impurity removal.

       1064nm DPSS Laser Source      Specifications     Diagrams     Applications